Review
Review of Surface and Thin Film Processing by Gas Cluster Ion Irradiation
A. V. Nazarov
Lomonosov Moscow State University, Skobeltsyn Institute of Nuclear Physics, 1(2), Leninskie Gory, GSP-1, 119991, Moscow, Russia
Lomonosov Moscow State University, Faculty of Physics, Department of Physical Electronics, 1(2), Leninskie Gory, GSP-1, 119991, Moscow, Russia
e-mail: av.nazarov@physics.msu.ru
D. S. Kireev
Lomonosov Moscow State University, Faculty of Physics, Department of Physical Electronics, 1(2), Leninskie Gory, GSP-1, 119991, Moscow, Russia
A. E. Ieshkin
Lomonosov Moscow State University, Faculty of Physics, Department of Physical Electronics, 1(2), Leninskie Gory, GSP-1, 119991, Moscow, Russia
D. R. Bessmertnyi
Lomonosov Moscow State University, Faculty of Physics, Department of Physical Electronics, 1(2), Leninskie Gory, GSP-1, 119991, Moscow, Russia
I. N. Kutlusurin
Lomonosov Moscow State University, Faculty of Physics, Department of Physical Electronics, 1(2), Leninskie Gory, GSP-1, 119991, Moscow, Russia
V. S. Chernysh
Lomonosov Moscow State University, Skobeltsyn Institute of Nuclear Physics, 1(2), Leninskie Gory, GSP-1, 119991, Moscow, Russia
Lomonosov Moscow State University, Faculty of Physics, Department of Physical Electronics, 1(2), Leninskie Gory, GSP-1, 119991, Moscow, Russia
Abstract
Currently, second-generation high-temperature superconducting (2G HTS) tapes occupy a special place in the superconductor industry. These are planar structures in which an HTS layer is epitaxially deposited onto a multilayer buffer stack. In such tapes, both the morphology of the superconducting layer itself and the interface structure are critically important. Gas cluster ion beam (GCIB) technology is a relatively new method for the material surface processing. GCIB is widely used, in particular, for ultra-fine surface polishing and planarization, owing to the specific features of cluster ion interaction with the material and the shallow depth of the damaged layer. This paper presents a detailed review of surface modification technology for various materials, including thin films, using GCIB. The review covers the principles of cluster beam generation and the design of GCIB accelerators, the mechanisms of their interaction with surfaces, and the main effects of cluster irradiation, such as smoothing or nanostructuring of the surface topography and modification of the target surface composition. In addition, the paper summarizes existing data on the GCIB irradiation of materials related to superconductor technology and discusses the potential prospects for applying GCIB in the fabrication of secondgeneration HTS tapes to improve their performance.
Keywords: gas cluster ions; surface processing; thin films; sputtering; surface smoothing; nanostructuring.
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